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China To Host International Metrology Technology & Equipment Exhibition

China will host the 2020 International Metrology Technology & Equipment Exhibition (CMTE) at the Shanghai World Exhibition and Conference Center 18-20 May 2020. The event will cover 17,000 sqm (180,000 sqft) and has been organised to coincide with the 2020 World Metrology Day scheduled for May 20th.

The timing of the event also synchronizes with China’s focus on its government’s ‘Made in China 2025’ policy, whereby China aims to move away from being the world’s “factory” producing low cost goods, to transitioning to producing higher value products and services, representing in essence a blueprint to upgrade the manufacturing capabilities of Chinese industries. Under ‘Made in China 2015’ the role of metrology in China’s manufacturing sector will significantly increase as product quality and productivity is enhanced to world class status.

Until now the metrology sector has never had a dedicated trade-show in China with the sector having to present its products within specific industry sector exhibitions. China has already become the largest single market for global metrology equipment suppliers, and is predicted to significantly increase its consumption over the coming years, so now having a dedicated expo event representing the industry is timely.

The CMTE event is being supported by the following official Chinese organizations:

  • China National Institute of Metrology
  • China Institute of Measurement and Testing Technology
  • China Metrology Association
  • Chinese Society for Measurement
  • Shanghai Institute of Measurement and Testing Technology

The event will bring together both domestic and international suppliers of metrology technology, measuring and calibration equipment, sensors, software, automation, calibration and metrology services providers. In parallel with the expo a series of keynote speeches are planned along with a seminar series with topics including Made-in-China 2025, innovations in metrology, metrology 4.0, regional collaborations and reforms of national metrology organizations. The event will be highlighted with a series of brain storming sessions with the purpose of making connections between theoretical achievements from research and end-user solution seekers and industrial enterprises.

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