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Optical

Next Generation OCD Metrology Platform to Enable Process Control for Advanced AI Devices

Onto Innovation has introduced the Atlas G6 optical critical dimension (OCD) metrology system, designed to address the growing complexity of process control in advanced semiconductor nodes. As the industry transitions to second generation gate-all-around (GAA) logic and future vertical gate DRAM architectures to support AI applications, manufacturers face tighter structural dimensions, shrinking by up to 30% per generation.

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