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Next Generation OCD Metrology Platform to Enable Process Control for Advanced AI Devices

Onto Innovation has introduced the Atlas G6 optical critical dimension (OCD) metrology system, designed to address the growing complexity of process control in advanced semiconductor nodes. As the industry transitions to second generation gate-all-around (GAA) logic and future vertical gate DRAM architectures to support AI applications, manufacturers face tighter structural dimensions, shrinking by up to 30% per generation.

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Verisurf 2026 Launch To Drive Digital Manufacturing with Repeatable Process Control

Verisurf Software has announced the release of Verisurf 2026, the latest version of its model-based metrology platform. Built on a legacy of innovation and customer-focused development, Verisurf 2026 introduces new features and workflow improvements designed to help manufacturers reduce costs, save time, and enhance repeatable process control across all stages of digital manufacturing.

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