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Month: September 2025

Next Generation OCD Metrology Platform to Enable Process Control for Advanced AI Devices

Onto Innovation has introduced the Atlas G6 optical critical dimension (OCD) metrology system, designed to address the growing complexity of process control in advanced semiconductor nodes. As the industry transitions to second generation gate-all-around (GAA) logic and future vertical gate DRAM architectures to support AI applications, manufacturers face tighter structural dimensions, shrinking by up to 30% per generation.

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Advancing Multi-Modal Metrology for 6D Pose Accuracy

In industrial and research settings, accurate 6D object pose estimation, determining the position and orientation of objects in three dimensions, is a cornerstone for automated inspection, assembly, and manipulation. Traditional machine vision systems provide good accuracy under ideal conditions, but performance often deteriorates when objects are partially occluded, reflective, or manipulated by a robot hand.

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