R & D and Best Practices for Measurement in Industry

The International Metrology Congress will be held 19 to 21 September 2017 in Paris, France alongside with the ENOVA Exhibition.
The event allows:
 to improve measurement, analysis and testing processes, and control risks,
 to follow the evolution of techniques, advances in R&D and discover industrial applications,
 to explore the exhibition showcasing innovations and solutions.
The congress presentations deal with:
 processes: uncertainties, calibration, verification, training, cost optimisation…
 techniques: mass, force, flow, dimensional, electricity, temperature, optics, chemical measurements, biological measurements…
 prospects: dynamic measurements, additive manufacturing, data metrology, smart grids, nanotechnology, biotechnology and health, environmental concerns…

The call for technical papers is open until 15 January 2017:

visit www.cim2017.com/index-en.html to send your paper abstract.
For more information: 33 (0)4 67 06 20 36 – info@cfmetrologie.com